Question is ⇒ The primary reason for the widespread use of Si in semiconductor device technology is, Options are ⇒ (A) abundance of Si on the surface of earth, (B) larger band gap of Si in comparison to Ge, (C) favourable properties of Silicon-dioxide (SiO<sub>2</sub>), (D) lower melting point, (E) , Leave your comments or Download question paper.

Question is ⇒ The primary reason for the widespread use of Si in semiconductor device technology is, Options are ⇒ (A) abundance of Si on the surface of earth, (B) larger band gap of Si in comparison to Ge, (C) favourable properties of Silicon-dioxide (SiO<sub>2</sub>), (D) lower melting point, (E) , Leave your comments or Download question paper. Previous question Next question


Q1.	The primary reason for the widespread use of Si in semiconductor device technology is
A.	abundance of Si on the surface of earth [Wrong Answer]
B.	larger band gap of Si in comparison to Ge [Wrong Answer]
C.	favourable properties of Silicon-dioxide (SiO₂) [Correct Answer]
D.	lower melting point [Wrong Answer]
View Answer 4 -4 Explanation:- Answer : C Discuss it below : !! OOPS Login [Click here] is required to post your answer/result Help other students, write article, leave your comments

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