Question is ⇒ In n-well CMOS fabrication substrate is:, Options are ⇒ (A) heavily doped n-type, (B) heavily doped p-type, (C) lightly doped n-type, (D) lightly doped p-type, (E) , Leave your comments or Download question paper.

Question is ⇒ In n-well CMOS fabrication substrate is:, Options are ⇒ (A) heavily doped n-type, (B) heavily doped p-type, (C) lightly doped n-type, (D) lightly doped p-type, (E) , Leave your comments or Download question paper. Previous question Next question


Q1.	In n-well CMOS fabrication substrate is:
A.	heavily doped n-type [Wrong Answer]
B.	heavily doped p-type [Wrong Answer]
C.	lightly doped n-type [Wrong Answer]
D.	lightly doped p-type [Correct Answer]
View Answer 1 -1 Explanation:- Answer : D Discuss it below : !! OOPS Login [Click here] is required to post your answer/result Help other students, write article, leave your comments

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